Thanks for the explanation.
When diffusion is shared between adjacent rows, stress factors change depending on the
layout of the adjacent row. I was thinking they were trying to model a worst-case scenario with these parameters. I wondered why these parameters are not included among the approximately 40-50 random variation parameters they already have. They can be modeled the same way the variation of l or thinox is handled.
I found two online docs from PDF Solutions regarding this issue, which they call LLE (local layout effects). Based on device simulations they carried out, they report a 2-10% change in some parameters, such as mobility and threshold at 7nm. If the fab used measured IV data, these effects are already included in the models. Their temperature dependency may differ. Probably Berkeley people did the right thing by keeping them out.
I think these effects are accounted for twice when modeled with external proximity parameters. It is another way to add pessimism.