FW: Call for Abstracts due Friday Dec 11th

[Mary Sams]

From: TechConnect World Innovation Conference and Expo [mailto:mat...@www-nsti.ccsend.com] On Behalf Of TechConnect World Innovation Conference and Expo
Sent: Thursday, December 10, 2015 10:27 AM
To: msaedept engr.wisc.edu <msae...@engr.wisc.edu>
Subject: Call for Abstracts due Friday Dec 11th


[Nanotech 2016 and TechConnect World Innovation Conference and Expo]<http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDuxKAJHcOuVs230S-g3IZHjUS_8zeAzOWDKx-i7XjT-M4Yvo9bvWdYFmD3x9yEm0XLU0Q6gnbqdDTnx5AjIYShI1WuesL2l2qfNypbQPqTOv6_7Fmd92Qgs6UfQBPR_Figg3GSjRQV0q&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
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TechConnect World Innovation Conference & Expo
Call for Abstracts, due Friday Dec 11th

The 2016 TechConnect World Innovation Conference will be held May 22-25, Gaylord Convention Center, Washington DC, USA. On behalf of our symposium organizers we warmly invite you to submit your abstract or innovation. Technical Abstract due Dec. 11th for a 10% registration discount. Early-Stage Innovation due Jan. 22. Please reserve your Expo Space here. <http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDqwozYRJw5Q6vPRpyWLKHrFVGKno536SZmfYP8VkIvUFxr3PgYsUp0pzaYRwT2eDbgN2xPZzxrT6hnWVyTEdW3ZNiT3OZQaUqkq5EGXrWS_xiFpwDCM2WSUaAZITU72HS8hYMKFcSCp6pSwmJUwIbcyj-u8Ip59z0w==&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>

Submit Abstracts: due Dec. 11:




Submit Innovations: due Jan. 22

> Advanced Materials<http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDqwozYRJw5Q6LLkRK1l1PUejU7iVWAdzeO_3-UBU0gpV9qmQhX_6k_qeheukTtuESChRri01R4ZK58_0E3A3r_6XWacWVP8u6B5oR3COz8ORH6RBrSqA1B3kaYHRW78lXsLhMXlFgLOM97UPU13BDXX2Ax8zGOFASJ1FeO2LYM0qHC5HdcA7kef2wr58av_tEA4uAcP68L8f&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Advanced Manufacturing<http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDqwozYRJw5Q6HIRQerRwT-FY8dqUbtkI2IZUzPrFkEtw7lVntVv6hwDo_6S-hyTNFZJ9hYGlk7trSMP9JH8RtouVIUdENHIA9EVZH4BDF27OSp2UAFAvuZqoqwIcvNU2vLrXKD61pZMDFSKtY8dzocX2yJQfrtz4gWMQMfn2myNSysFw-PEJieSOXYBlJ2pb4PHJ3Kck7kqE&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Energy & Sustainability<http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDqwozYRJw5Q6m-yih-EVGlx_fMXeAkRqcw1_2-6A2VJB6ouiX4NzwobTgqBw8JIdHUyB78WurwT7wH2D2MCQJe4IvEqN2l1r7rTRZwj_m9CGTiEfuK9idzWgFtuQJaZkdaruGC_49vsJNNPap3djslX1hhcAe4wqZn-CppEgdQap0uaRnSV9s2BYT_i-YdyvefUOBlF6z9Yb&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Electronics & Microsystems<http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDqwozYRJw5Q6-KK9qCzGBUBovlFKIYmX4V3rkgZ9Epigzwd_5UAPq1TpkPCflGy_Jas_K9oThlp4KVR8nQbD9bKxK99a02QJmJpFUWKwWlhLeOmln5u0ET3Bmwj9mZadmVH0RS-2lpszbOiY1D7cLSXRgm2Q4dNV5xg6efUoU85IeeY7sAm_ozhk1OYdMfMJ6WexTVVbOi9Q&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Biotech & Biomedical<http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDqwozYRJw5Q6Tu7AQl41c8cDjE9hvD9evcDBD8CPZudPESumm6fmhT0VKCHppAQu5cd8TeBtzDrctYSThzAxJ-hFqlqc53jy_WLWxZSimTUtmBFYw0Cf3AflRLX8hYJ_AZ3MuTKxcDjSrhlXZsZdtpox1iE6stXScNKVCH_3FJUaIm6mDlwXMQxxkNtuOsPD2g==&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Personal Care, Cosmetics & Foods <http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDqwozYRJw5Q61EGcHsU7kYO8GhU6R84yzx6BW6okaju-cGijSdvOV2nu6CvuWk5wlbrrEsJfo994nxnfAMT5WumfcU21T8O9DG-li11rD4D9XTbQ533txqMCvCnG53n6zcEHOjq2HquQGrnPvEM7ilh75RtaYN2ZVNUMqw-XnOdUv4orv59n9eKc5vw23_BDMBnkgHwxE7rnTWRiJLUmnfU=&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>



> University TTOs & TLOs<http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDsLJeW4oLUtp7S9fNYUsVWjfMcHmChuGzJnFcykAH-MKGsFeTgdCD4OwjwMWMkdsNgfOvgDJKvKa135t2SyWWGwI4OvAPBurtd0O1pwb9rFXLxYf6myHbvGlnRZfQlZ_8aFabNNxEacQMEemWh4CiPCZamuyetDEetDzt3vl2MQerDJs7KlkALQ=&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Federal/National Labs <http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDsLJeW4oLUtp7S9fNYUsVWjfMcHmChuGzJnFcykAH-MKGsFeTgdCD4OwjwMWMkdsNgfOvgDJKvKa135t2SyWWGwI4OvAPBurtd0O1pwb9rFXLxYf6myHbvGlnRZfQlZ_8aFabNNxEacQMEemWh4CiPCZamuyetDEetDzt3vl2MQerDJs7KlkALQ=&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Early-Stage Companies <http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDsLJeW4oLUtp7S9fNYUsVWjfMcHmChuGzJnFcykAH-MKGsFeTgdCD4OwjwMWMkdsNgfOvgDJKvKa135t2SyWWGwI4OvAPBurtd0O1pwb9rFXLxYf6myHbvGlnRZfQlZ_8aFabNNxEacQMEemWh4CiPCZamuyetDEetDzt3vl2MQerDJs7KlkALQ=&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> SBIR/STTR Awardees<http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDsLJeW4oLUtp7S9fNYUsVWjfMcHmChuGzJnFcykAH-MKGsFeTgdCD4OwjwMWMkdsNgfOvgDJKvKa135t2SyWWGwI4OvAPBurtd0O1pwb9rFXLxYf6myHbvGlnRZfQlZ_8aFabNNxEacQMEemWh4CiPCZamuyetDEetDzt3vl2MQerDJs7KlkALQ=&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Venture/Incubator Portfolios <http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDsLJeW4oLUtp7S9fNYUsVWjfMcHmChuGzJnFcykAH-MKGsFeTgdCD4OwjwMWMkdsNgfOvgDJKvKa135t2SyWWGwI4OvAPBurtd0O1pwb9rFXLxYf6myHbvGlnRZfQlZ_8aFabNNxEacQMEemWh4CiPCZamuyetDEetDzt3vl2MQerDJs7KlkALQ=&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>
> Corporate R&D <http://r20.rs6.net/tn.jsp?f=001RO5K9U6o_aJZPQIfI4SrYZNvq1ux3Royb6GwLR1oCc-OKMQTFzFHDsLJeW4oLUtp7S9fNYUsVWjfMcHmChuGzJnFcykAH-MKGsFeTgdCD4OwjwMWMkdsNgfOvgDJKvKa135t2SyWWGwI4OvAPBurtd0O1pwb9rFXLxYf6myHbvGlnRZfQlZ_8aFabNNxEacQMEemWh4CiPCZamuyetDEetDzt3vl2MQerDJs7KlkALQ=&c=6k9M3C5mxyXqT_lz8LV5Qv4_MmoNo0ujgg4KwS80NKJkKkvE-HSkng==&ch=g42MR_nMgpD5TWi1SGLOIMBgeXKqKPTWzBRMMmqUZU6yrx_y50ifcw==>




First 100 Speakers Include:

· Aaron D. Franklin, Duke University
· Abhishek Shrivastava, Dow
· Agata Exner, Case Western Reserve Univ.
· Ahmed Busnaina, Northeastern University
· Akhilesh K Gaharwar, Texas A&M University
· Alan Lesser, UMass, Amherst
· Alexander Orlov, Stony Brook Univ.
· Alison Elder, University of Rochester
· Andrew DeHennis, Senseonics, Inc.
· Anil Patri, US Food & Drug Admin.
· Antonio F. Facchetti, Polyera Corporation
· Ara Nazarian, Harvard Medical School
· Armin Völkel, Palo Alto Research Center
· Ashutosh Chilkoti, Duke University
· Bjørn Petter Jelle, Norwegian University of S&T
· Brent M Segal, Lockheed Martin
· Brian Richard Pauw, Federal Institute for Materials Research & Testing, Germany
· Chris Menzel, Fujifilm Dimatix, Inc.
· Christopher A Schuh, MIT
· Dalia Yablon, SurfaceChar LLC
· David J. Heldebrant, Pacific Northwest
National Laboratory
· Dhimiter Bello, UMass Lowell
· Dmitri Simberg, University of Colorado
· Donna Lee Ho, US Dept. of Energy
· Edward P. Furlani, University at Buffalo
· Elena Webster, Dow Building Solutions
· Elizabeth Burton, Lawrence Berkeley
National Laboratory
· Emanuel Tutuc, University of Texas, Austin
· Gabor A. Somorjai, University of California
at Berkeley
· Grant Page, Navy, Magna Imperio Systems Corp
· Greg Haugstad, University of Minnesota
· Guojun Liu, Queen's University, Canada
· Harriet Kung, US Dept. of Energy
· Hermenegildo Garcia, Universidad Politécnica de Valencia, Spain
· Howard Fairbrother, Johns Hopkins
· Hyunwoo Howie Jin, ExxonMobil
· Ian Griffiths, University of Oxford
· Imre Gyuk, US Dept. of Energy
· Jamie Lead, Univ. of South Carolina
· Jan Kosny, Fraunhofer Center for Sustainable Energy Systems CSE
· Jean Berthier, CEA-LETI-Minatec
· Jean-Christophe Baret, University of
Bordeaux, France
· Jean-Francois Damlencourt, CEA Grenoble
· Jean-Luc Dubois, Arkema
· Jessica Tucker, National Inst. for Biomedical Imaging & Bioengineering
· Jie Fan, Zhejiang University, China
· Johan Pluyter, International Flavors & Fragrances
· Justin Gorham, National Institute of Standards & Technology (NIST)
· Kevin Dorfman, University of Minnesota
· Kim Nelson, American Process Inc.
· Lance Criscuolo, Zyvex Technologies
· Larry Mann, Shoei Electronic Materials
· Li Piin Sung, National Institute of Standards & Technology (NIST)
· Linda Schadler, Rensselaer Polytechnic Institute
· Lisa Friedersdorf, National Nanotechnology Coordination Office
· Lloyd Whitman, Office of Science & Technology Policy, Office of the President
· Patrick Jones, Spectranetics Corporation
· Ramsia Sreij, Bielefeld University
· Nikhil A. Koratkar, Rensselaer Polytechnic Institute
· Chuck Zhang, Georgia Institute of Technology
· Rein V. Ulijn, CUNY



· Loucas Tsakalakos, GE Global Research
· Mandakini Kanungo, Xerox Innovation
· Mansoor M. Amiji, Northeastern University
· Marcellino Gemelli, Bosch Sensortec
· Martin Schoeppler, FUJIFILM Dimatix
· Matthew Lamm, Merck
· Mehran Mehregany, Case School of Engineering
· Michael Makowski, PPG Industries
· Nathan Gianneschi, UCSD
· Nicole F. Steinmetz, Case Western
Reserve University
· Pat Spicer, University of New South Wales, Australia
· Paul Bohn, University of Notre Dame
· Paul Brookes, EMD Performance Materials
· Pei Yu Eric Chiou, UCLA
· Pete Trefonas, Dow Chemical Co.
· Philip Demokritou, Harvard School of Public Health
· Philippe Serp, CNRS, Institute National Polytechnique de Toulouse
· Piotr Grodzinski, National Cancer Inst.
· Prantik Mazumder, Corning Incorporated
· Prithwiraj Maitra, Johnson & Johnson
· Rahul Sharma, Dow Chemical Co.
· Rajesh N. Davé, New Jersey Institute of Technology
· Rigoberto Advincula, Case Western
Reserve University
· Robert Wadams, Pfizer Inc.
· Roger Rousseau, Pacific Northwest
National Laboratory
· Ron Munson, Global CCS Institute
· Rushan Sakhibgareev, Chevron
· Sarad Parekh, Sweetwater Energy
· Scott Blanchet, Nuvera Fuel Cells
· Scott Twary, Los Alamos National Lab
· Sean Ireland, Imerys
· Shaoul Lapidot, Melodea Ltd.
· Sinan Keten, Northwestern University
· Sotiris E. Pratsinis, Swiss Federal Institute
of Technology
· Srinivas Iyer, Los Alamos National Lab
· Stefanie Harvey, TE Connectivity
· Steven Zullo, NIBIB/NIH
· Susana Addo Ntim, US Food & Drug Administration
· T. J. (Lakis) Mountziaris, University of
Massachusetts, Amherst
· Tao Zhang, Chinese Academy of Sciences
· Thomas Anchordoquy, University of Colorado School of Pharmacy
· Thomas E. Twardowski, Integra Life Sciences Corp.
· Timothy Duncan, US Food & Drug Administration
· Vladimir Zharov, University of Arkansas for Medical Sciences (UAMS)
· Vuk Uskoković, University of Illinois at Chicago
· Wendel Wohlleben, BASF
· Wolfgang S. Bacsa, University of Toulouse, France
· World L-S Nieh, US Forest Service
· Young-Hye Na, IBM Almaden Research Center
· Yuan Ma, Dalhousie University
· YuanQiao Rao, Dow Chemical Co.
· Zhiqun Lin, Georgia Institute of Technology
· Mathieu Meerts, KU Leuven
· Scott Leger, Fujifilm Dimatix, Inc.
· Enrico Sowade, Chemnitz University of Technology
· Treye Thomas, US Consumer Product Safety Commission
· Todd Hawkins, Tesla NanoCoatings
· Jeff Brogan, MesoScribe Technologies

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