Re: TSUPREM4

[Reinaldo Vega]

...so i figured out the silicidation part. Apparently, one can deposit
"polysili" and "poly." The latter can form a silicide. Very weird.

Still can't get it to oxidize, though...

- Reinaldo

"Reinaldo Vega" <or...@eecs.berkeley.edu> wrote in message
news:eotqba$1hl8$1...@agate.berkeley.edu...
> I've been fiddling around with this program to make a MOSFET structure,
> and I noticed something interesting. I cannot get my polysilicon gate to
> oxidize or to form a silicide contact (I've tried both Ti and Ni). Has
> anybody else noticed this? TSUPREM is very similar to Silvaco Athena in
> its syntax (although the visualization tools are, to be honest, not nearly
> as good), although in Athena it is possible to oxidize and/or form a
> silicide on a deposited poly layer. I'm hoping I simply made a mistake
> with my poly grid settings. I've attached a simplistic example here,
> where I formed NiSi at 600C/1min, and have not yet etched away the
> unreacted nickel. Notice how NiSi only forms over the S/D region.
> Hmmm...
>
> - Reinaldo
>
>