Dear Dr. Yatian Ning,
Thank you for your interest in the single-scale Maxwell-TDDFT method!
This method is developed for unified description of microscopic surface structure and light propagation effects.
However, this method is "overkill" for many cases despite it is bit numerically unstable. For most 2D thin films (thickness < 5 nm), the 2D Maxwell-TDDFT (2D approximation) method may be appropriate and is numerically stable.
For example:
For thicker films (thickness > 5 nm), the multiscale Maxwell-TDDFT method may be appropriate.
As a reference, I attached an input file (input.dat) of a single-scale Maxwell-TDDFT calculation for Si film used in the following paper:
Sincerely,
Shunsuke Yamada
Kansai Institute for Photon Science, QST, Japan
山田俊介
量子科学技術研究開発機構 関西光量子科学研究所