EUV sources and lasers are an essential component of the drive to achieve small structures as well as measure sub-50 nm devices and components. There are two schools of thoughts in the development of these sources - one uses Higher Harmonic Generation (HHG) and the other uses Plasma Focus Device for generating EUV light amongst others. In this tutorial two experts in the field - Dr Andrius Baltuska, Photonics Institute, Vienna University of Technology and Dr Rajdeep Rawat from NIE, Singapore will provide us with a short tutorial on these technologies and developments.