Hi Wouter. To clarify, were the EMAN class-averages you show done after or before you tried to eliminate the 'crowded' particles ? The EMAN class averages (which are done without a mask, unless you impose it yourself) seem to imply a significant amount of particle crowding still occurring. While it is possible to process data under somewhat crowded conditions through use of aggressive masking, and insuring that your particle picking is well-centered, it isn't optimal. Crowding can cause a number of problems in EMAN, particularly with SSNR estimation and centering of particles. Using other software doesn't really solve this problem, the problem will simply impact you in different ways. The best advice if you have heavy crowding is to return to the bench and target grids with (much) lower particle density. That is not to say it is completely impossible to process the existing data or get any results at all, just that the amount of effort you spend struggling to get the image processing to work around the problem in many cases is more than it would take to improve your grids, and I can virtually guarantee that you could achieve more robust structures at better resolution if you improve the data quality in this way.
That said, if you really need to process the existing data, there are a few tricks you can use:
1) Insure that your boxed out particles are well-centered. ie - one of the several particles which may be present in the box should be within a few pixels of the center of the box
2) use the file browser and select a particle stack from one of your images, and hit the 'filtertool' button
3) In FilterTool, add a "filter.lowpass.gauss" processor, followed by a "mask.soft" processor
- The filter.lowpass.gauss will allow you to make the particles blurrier so you can see them more easily. Adjust this to a convenient level for visualization
- You can then interactively adjust outer_radius and width on the mask.soft processor to find parameters which mask out the particles effectively in all orientations without having a sharp edge, or impeding on the particles themselves.
- once you have mask parameters you are satisfied with, make a note of the outer_radius and width, then close filtertool
4) In CTF->Generate Output, there are 3 empty text boxes.
- in the first of these, put "normalize.circlemean:radius=XX" where XX is the outer_radius you determined above
- In the second of these, put: mask.soft:outer_radius=XX:width=YY (replace XX and YY with your values).
- Make sure phase flipping is selected, and that your micrographs are selected just as they were when you last ran this program, then launch the task.
5) For each particle stack, this will produce an __proc variant of the file which has now has a soft mask applied to it.
6) Any particle sets you generated previously will lack the __proc variant, so rerun this step as well
7) now try running e2refine2d on the __proc variant of your particle set. This should give you somewhat nicer looking averages. Don't expect them to appear to be 'high resolution' but they should at least focus more on the different orientations of your particle than on the different variations of crowding present in your data
8) make an initial model from these new class-averages, and try an initial 3-D refinement, again using the masked particles.
If anything goes wrong in this process, please just ask about it